中文簡介

《等離子體化學(xué)與等離子體處理》是一份國際期刊，為發(fā)表有關(guān)等離子體化學(xué)與等離子體處理的基礎(chǔ)研究和新進展的原始論文提供了一個論壇。該雜志涵蓋了所有類型的工業(yè)加工等離子體，從非熱等離子體到熱等離子體，并出版了基礎(chǔ)等離子體研究以及特定等離子體應(yīng)用的研究。感興趣的應(yīng)用領(lǐng)域包括微電子和其他領(lǐng)域的等離子體蝕刻、薄膜和涂層的沉積、粉末合成、環(huán)境處理、照明、表面改性等。包括等離子體的化學(xué)動力學(xué)研究，以及等離子體與表面的相互作用。

投稿網(wǎng)址：http://mc.manuscriptcentral.com/pcpp

英文簡介

Plasma Chemistry and Plasma Processing is an international journal that provides a forum for the publication of original papers on fundamental research and new developments in plasma chemistry and plasma processing. The journal encompasses all types of industrial processing plasmas, ranging from nonthermal plasmas to thermal plasmas, and publishes fundamental plasma studies as well as studies of specific plasma applications. Application contexts of interest include plasma etching in microelectronics and other fields, deposition of thin films and coatings, powder synthesis, environmental processing, lighting, surface modification and others. Includes studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces.